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Electron beam lithographyEdit
Nano imprint lithography (NIL)Edit
Focused Ion Beam TechniquesEdit
Electron Beam Induced Deposition (EBID or EBD)Edit
The highly focused electron beam in a SEM is used for imaging nanostructures, but it can also be used to make nanoscale deposits. In the presence of carbonaceous or organometallic gasses in the SEM chamber, electron beam induced deposition (EBID or electron beam deposition (EBD)) can be used to construct three-dimensional nanostructures or solder/glue nanostructures.
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